The QY-CVD series chemical vapor deposition system is a chemical technology that mainly utilizes one or several gas-phase compounds or elements containing thin film elements to generate thin films through chemical reactions on the substrate surface. Widely used for purifying substances, developing new crystals, and depositing various single crystal, polycrystalline, or glassy inorganic thin film materials.
Vacuum coating solution
Chemical Vapor Deposition System (CVD)
Product overview
产品特点
PRODUCTFEATURE

High product integration and automated control
PLC programming, visual display settings
Complete safety interlock design and warning system
产品规格
PRODUCTPARAMETER
Product model | QY- CVD |
Device Type | Monomer machine |
Ultimate pressure | 5×10⁻⁴Pa |
Vacuum system configuration | Diffusion pump/molecular pump/low-temperature pump+(Roots pump)+rotary vane pump/screw pump |
Fixture | Flat |
Drying temperature | ≤600℃ |
Coating thickness | ≤500nm |
Electrode | plate-type |
Power supply | Radio frequency |